i-line 365nm wavelength

I-Line like G-line is not chemically amplified.  It relies on a photo activated compound to diffuse in the post exposure bake (PEB) step, however a PEB may not be necessary if enough PAC is in the resist film.


Choose us at Photolithography.net for any of the following and more:

  • Photoresist coating optimization
  • Photoresist changing and process characterization
  • Photoresist use reduction (RRC)
  • HMDS use optimization
  • Critical Dimension Uniformity (CDU) optimization.  CDU should typically be less than 1% of feature size 1 sigma.
  • Developer use for CD control
  • Scanner to track throughput matching
  • Defect investigations